“MAIN TECHNOLOGICAL FACTORS AFFECTING THE PROPERTIES OF LOW-DOPED LAYERS AND TRANSISTOR n+-p0 – n0 STRUCTURES”, Eur. j. emerg. technol. discov., vol. 2, no. 3, pp. 41–47, Apr. 2024, Accessed: Sep. 12, 2025. [Online]. Available: https://europeanscience.org/index.php/1/article/view/496